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This work is licensed under a Creative Commons Attribution-NonCommercial 4.0 International License
Article
Ultra Short Pulsed Laser Deposition Technology for Industrial Applications
Author(s)
Dr Jari Liimatainen*, Ville Kekkonen, Jarkko Piirto, Juho Kaisto, Dr Aleksey Zolotukhin and Dr Saumyadip Chaudhuri
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DOI:10.17265/2161-6221/2015.5-6.002
Affiliation(s)
Picodeon Oy Ltd, Piisilta 1, 91100, Ii, Finland
ABSTRACT
PLD (Pulsed laser deposition technology) has been actively developed since 1980’s for variety of applications and materials systems. PLD technology has been considered as an attractive, flexible production method for complex oxides due to its intrinsic benefits for maintaining stoichiometry and producing good quality thin films e.g. for high temperature superconductors. Stoichiometric material transfer from target to substrate, excellent adhesion for various substrates and possibility to process wide range of materials is attractive technical advantages that can be utilized in variety of existing and emerging application areas. Industrial applications have been limited by e.g. undesirable particle formation in traditional PLD technology based on ns-second pulse lengths and challenges in scale-up for industrial production. This paper describes recent findings in the development and use of ultrashort, ultrafast pulse laser deposition technology for nanoporous functional films using ultra short pulse and ultrashort repetition rate laser and advanced scanning technology.
KEYWORDS
PLD (Pulsed laser deposition), cold ablation, metallic thin films, sensors, phovoltaics, lithium ion battery coatings.
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